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Nanostructure fabrication using selective growth on nanosize patterns drawn by a scanning probe microscope
https://sucra.repo.nii.ac.jp/records/13229
https://sucra.repo.nii.ac.jp/records/1322937989b97-5699-4adf-8998-d0a139c93b20
名前 / ファイル | ライセンス | アクション |
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A1002601.pdf (267.4 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2008-04-17 | |||||
タイトル | ||||||
タイトル | Nanostructure fabrication using selective growth on nanosize patterns drawn by a scanning probe microscope | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | nanostructure | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | molecular crystal | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | MoS2 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | GaSe | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | C-60 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | AFM | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | STM | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | selective growth | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | van der Waals epitaxy | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Sasaki, Kentaro
× Sasaki, Kentaro× 上野, 啓司× 小間, 篤 |
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著者 ローマ字 | ||||||
Sasaki, Kentaro | ||||||
著者 ローマ字 | ||||||
Ueno, Keiji | ||||||
著者 ローマ字 | ||||||
Koma, Atsushi | ||||||
著者 所属 | ||||||
著者 所属 | ||||||
東京大学大学院理学系研究科(現 : 埼玉大学大学院理工学研究科物質科学部門) | ||||||
著者 所属(別言語) | ||||||
Department of Chemistry, The University of Tokyo | ||||||
著者 所属(別言語) | ||||||
Department of Chemistry, The University of Tokyo(Present : Graduate School of Science and Engineering, Saitama University) | ||||||
著者 所属(別言語) | ||||||
Department of Chemistry, The University of Tokyo | ||||||
書誌情報 |
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 巻 36, 号 6B, p. 4061-4064, 発行日 1997 |
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年月次 | ||||||
1997-6 | ||||||
出版者名 | ||||||
出版者 | 社団法人応用物理学会 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00214922 | |||||
関連サイト | ||||||
内容記述タイプ | Other | |||||
内容記述 | http://jjap.ipap.jp/link?JJAP/36/4061/ | http://jjap.ipap.jp/link?JJAP/36/4061/ | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | A novel method of fabricating organic material nanostructures using selective growth on patterned layered material surfaces has been developed. First, an epitaxial monolayer film of layered semiconductor GaSe was gown on a cleaved face of MoS2. Then, nanosize patterns were drawn by scratching only the grown GaSe film using an atomic force microscope (AFM). Next, C-60 molecules were deposited on the surface. It has been found that if a substrate temperature is appropriately chosen, C-60 molecules nucleate only on the bare MoS2 surface and fill up the carved nanostructures. This combination of AFM lithography and selective growth enables the formation of C-60 nanostructures as small as 10 nm. | |||||
版 | ||||||
[著者版] | ||||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | text | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
作成日 | ||||||
日付 | 2008-04-17 | |||||
日付タイプ | Created | |||||
アイテムID | ||||||
A1002601 |