WEKO3
アイテム
{"_buckets": {"deposit": "6defa46c-4c52-485e-a774-b4a080ada90d"}, "_deposit": {"created_by": 3, "id": "16649", "owners": [3], "pid": {"revision_id": 0, "type": "depid", "value": "16649"}, "status": "published"}, "_oai": {"id": "oai:sucra.repo.nii.ac.jp:00016649", "sets": ["635"]}, "author_link": ["27148", "28731", "28730", "27147", "28729"], "item_120_biblio_info_8": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2003", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "24", "bibliographicPageStart": "21", "bibliographicVolumeNumber": "3", "bibliographic_titles": [{"bibliographic_title": "埼玉大学地域共同研究センター紀要"}, {"bibliographic_title": "Report of Cooperative Research Center, Saitama University", "bibliographic_titleLang": "en"}]}]}, "item_120_date_31": {"attribute_name": "作成日", "attribute_value_mlt": [{"subitem_date_issued_datetime": "2009-06-18", "subitem_date_issued_type": "Created"}]}, "item_120_description_19": {"attribute_name": "概要", "attribute_value_mlt": [{"subitem_description": "ceria(CeO2) slurry has a strong merit in CMP polishing to give a high removal rate and is more and more used. Polishing efficiency such as removal rate must depend essentially on intrinsic properties ofSi02powder .In the present study we investigated the polishing properties and sbmy stability 00 new powders which have been tuned at during synthesis to increase their polishing efficiency. We investigated those properties in the range of pH of 3 to 10 and compared performances to commercial slwries. We could get with the best powder a removal rate 1.5times superior to ceria commercial sluny and 8 times higher than silica commercial sluny. However those 3 powders proved not to have so good sedimentation stability at pH of 7. This should be solved by tuning the formulation by addition of appropriate surfactant", "subitem_description_type": "Other"}]}, "item_120_description_29": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"subitem_description": "text", "subitem_description_type": "Other"}]}, "item_120_description_30": {"attribute_name": "フォーマット", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_120_identifier_registration": {"attribute_name": "ID登録", "attribute_value_mlt": [{"subitem_identifier_reg_text": "10.24561/00016643", "subitem_identifier_reg_type": "JaLC"}]}, "item_120_publisher_11": {"attribute_name": "出版者名", "attribute_value_mlt": [{"subitem_publisher": "埼玉大学地域共同研究センター"}]}, "item_120_source_id_14": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "13474758", "subitem_source_identifier_type": "ISSN"}]}, "item_120_text_3": {"attribute_name": "著者 ローマ字", "attribute_value_mlt": [{"subitem_text_value": "B. PACAUD"}, {"subitem_text_value": "T. K. DOY"}, {"subitem_text_value": "Y. UEKI"}, {"subitem_text_value": "Y. SASAKAWA"}, {"subitem_text_value": "E. ROHART"}]}, "item_120_text_32": {"attribute_name": "アイテムID", "attribute_value_mlt": [{"subitem_text_value": "KY-AA11808968-03-05"}]}, "item_120_text_35": {"attribute_name": "公開日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "May 21, 2009 09:00:00"}]}, "item_120_text_36": {"attribute_name": "記録日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "2009-06-18"}]}, "item_120_text_37": {"attribute_name": "最終更新日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 18, 2009 13:00:45"}]}, "item_120_text_38": {"attribute_name": "公開日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "May 21, 2009 09:00:00"}]}, "item_120_text_39": {"attribute_name": "更新履歴(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 18, 2009 所有者を murata から sucra_jim4 に変更"}, {"subitem_text_value": "Jun 18, 2009 フリーキーワード, 作成日, 記録日 を変更"}, {"subitem_text_value": "Jun 4, 2009 所有者を sucra_jim4 から murata に変更"}, {"subitem_text_value": "May 21, 2009 フリーキーワード, インデックス, 抄録, キーワード を変更"}]}, "item_120_text_4": {"attribute_name": "著者 所属", "attribute_value_mlt": [{"subitem_text_value": "Rhodia Electronics \u0026 Catalysis"}, {"subitem_text_value": "Saitama University"}, {"subitem_text_value": "Saitama University"}, {"subitem_text_value": "Saitama University"}, {"subitem_text_value": "Rhodia Electronics \u0026 Catalysis"}]}, "item_120_text_40": {"attribute_name": "登録者(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "sucra_jim4"}]}, "item_120_text_41": {"attribute_name": "閲覧数(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "972"}]}, "item_120_text_42": {"attribute_name": "ダウンロード数(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "642"}]}, "item_120_text_43": {"attribute_name": "XooNIps_インデックス", "attribute_value_mlt": [{"subitem_text_value": "Public/ジャンル別/研究紀要/埼玉大学/地域共同研究センター紀要|Public/埼玉大学/教育学部|Public/主題別/工学/機械工学/生産工学・加工学|sucra_jim4/埼玉大学/murata"}]}, "item_120_text_44": {"attribute_name": "XooNIps_ITEM_KEY", "attribute_value_mlt": [{"subitem_text_value": "4091"}]}, "item_120_text_9": {"attribute_name": "年月次", "attribute_value_mlt": [{"subitem_text_value": "2002"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "PACAUD, PACAUDB."}], "nameIdentifiers": [{"nameIdentifier": "27147", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "土肥, 俊郎"}], "nameIdentifiers": [{"nameIdentifier": "27148", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "UEKI, Y."}], "nameIdentifiers": [{"nameIdentifier": "28729", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "SASAKAWA, Y."}], "nameIdentifiers": [{"nameIdentifier": "28730", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "ROHART, E."}], "nameIdentifiers": [{"nameIdentifier": "28731", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2018-01-24"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "KY-AA11808968-03-05.pdf", "filesize": [{"value": "207.9 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 207900.0, "url": {"label": "KY-AA11808968-03-05.pdf", "url": "https://sucra.repo.nii.ac.jp/record/16649/files/KY-AA11808968-03-05.pdf"}, "version_id": "3c5a81f7-2e27-4f84-aead-54ee248aa10c"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "CMP", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Ceria slurry", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Removal rate", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Surface roughness", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Zeta potential", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "departmental bulletin paper", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "NEW CERIUM POWDERS FOR OXIDE FILM PLANARIZATION-CMP", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "NEW CERIUM POWDERS FOR OXIDE FILM PLANARIZATION-CMP"}]}, "item_type_id": "120", "owner": "3", "path": ["635"], "permalink_uri": "https://doi.org/10.24561/00016643", "pubdate": {"attribute_name": "公開日", "attribute_value": "2009-05-21"}, "publish_date": "2009-05-21", "publish_status": "0", "recid": "16649", "relation": {}, "relation_version_is_last": true, "title": ["NEW CERIUM POWDERS FOR OXIDE FILM PLANARIZATION-CMP"], "weko_shared_id": 3}
NEW CERIUM POWDERS FOR OXIDE FILM PLANARIZATION-CMP
https://doi.org/10.24561/00016643
https://doi.org/10.24561/000166438a67b621-e21e-4ef5-972d-071f1aa8ab4d
名前 / ファイル | ライセンス | アクション |
---|---|---|
KY-AA11808968-03-05.pdf (207.9 kB)
|
|
Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2009-05-21 | |||||
タイトル | ||||||
タイトル | NEW CERIUM POWDERS FOR OXIDE FILM PLANARIZATION-CMP | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | CMP | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Ceria slurry | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Removal rate | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Surface roughness | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Zeta potential | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
ID登録 | ||||||
ID登録 | 10.24561/00016643 | |||||
ID登録タイプ | JaLC | |||||
著者 |
PACAUD, PACAUDB.
× PACAUD, PACAUDB.× 土肥, 俊郎× UEKI, Y.× SASAKAWA, Y.× ROHART, E. |
|||||
著者 ローマ字 | ||||||
B. PACAUD | ||||||
著者 ローマ字 | ||||||
T. K. DOY | ||||||
著者 ローマ字 | ||||||
Y. UEKI | ||||||
著者 ローマ字 | ||||||
Y. SASAKAWA | ||||||
著者 ローマ字 | ||||||
E. ROHART | ||||||
著者 所属 | ||||||
Rhodia Electronics & Catalysis | ||||||
著者 所属 | ||||||
Saitama University | ||||||
著者 所属 | ||||||
Saitama University | ||||||
著者 所属 | ||||||
Saitama University | ||||||
著者 所属 | ||||||
Rhodia Electronics & Catalysis | ||||||
書誌情報 |
埼玉大学地域共同研究センター紀要 en : Report of Cooperative Research Center, Saitama University 巻 3, p. 21-24, 発行日 2003 |
|||||
年月次 | ||||||
2002 | ||||||
出版者名 | ||||||
出版者 | 埼玉大学地域共同研究センター | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13474758 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | ceria(CeO2) slurry has a strong merit in CMP polishing to give a high removal rate and is more and more used. Polishing efficiency such as removal rate must depend essentially on intrinsic properties ofSi02powder .In the present study we investigated the polishing properties and sbmy stability 00 new powders which have been tuned at during synthesis to increase their polishing efficiency. We investigated those properties in the range of pH of 3 to 10 and compared performances to commercial slwries. We could get with the best powder a removal rate 1.5times superior to ceria commercial sluny and 8 times higher than silica commercial sluny. However those 3 powders proved not to have so good sedimentation stability at pH of 7. This should be solved by tuning the formulation by addition of appropriate surfactant | |||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | text | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
作成日 | ||||||
日付 | 2009-06-18 | |||||
日付タイプ | Created | |||||
アイテムID | ||||||
KY-AA11808968-03-05 |