@article{oai:sucra.repo.nii.ac.jp:00012948,
 author = {Yoshikawa, Genki and Miyadera, Tetsuhiko and Onoki, Ryo and 上野, 啓司 and Nakai, Ikuyo and Entani, Shiro and Ikeda, Susumu and Guo, Dong and Kiguchi, Manabu and Kondoh, Hiroshi and Ohta, Toshiaki and Saiki, Koichiro},
 issue = {12},
 journal = {SURFACE SCIENCE},
 month = {},
 note = {Molecular orientations of pentacene ultrathin films grown on SiO2 substrates were studied without the influence of the atmosphere by vacuum atomic force microscopy (V-AFM) and near edge X-ray absorption fine structure (NEXAFS). The experimental processes from deposition of pentacene to characterization of films were performed under vacuum condition without exposure to the atmosphere. V-AFM and NEXAFS measurements showed that pentacene molecules tend to grow on SiO2 surface with their molecular long axes perpendicular to the substrate surfaces (standing-mode) irrespective of preparation procedure of SiO2 substrate. (c) 2006 Elsevier B.V. All rights reserved., http://www.sciencedirect.com/science/journal/00396028, text, application/pdf},
 pages = {2518--2522},
 title = {In-situ measurement of molecular orientation of the pentacene ultrathin films grown on SiO2 substrates},
 volume = {600},
 year = {2006},
 yomi = {オノキ, リョウ and ウエノ, ケイジ}
}