{"created":"2023-05-15T15:26:41.113975+00:00","id":14785,"links":{},"metadata":{"_buckets":{"deposit":"c99a3b49-c3ce-4380-81d0-c875d799f4d0"},"_deposit":{"created_by":3,"id":"14785","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"14785"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00014785","sets":["95:240:496:486"]},"author_link":["25072"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Characteristics of Lead Glass Films by CVD Method"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1993","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"21","bibliographicPageStart":"18","bibliographicVolumeNumber":"13","bibliographic_titles":[{"bibliographic_title":"CACS FORUM"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2010-01-14","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"A new fabrication method of silicon micro channel plate (MCP) by semiconductor microfabrication technologies has developed instead of conventional MCP using glass micro capillaries. This fabrication method stands on the technologies of chemical vapor deposition (CVD) to deposit electron multiplication films on the sufaces of the micro channels. The electron multiplication films are lead glass using tetra-ethyl lead and silicon tetra-ethoxide or silicon tatra-methoxide. The composition ratio of silicon and lead in the films changes according to a ratio of the flow rate of the supplied gas sources. The sheet resistance of the films depends on the film composision, annealing and hydrogen reduction conditions. A suitable sheet resistance for the application to MCP can be performed by controlling there conditions.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00014779","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学分析センター"}]},"item_120_text_27":{"attribute_name":"版","attribute_value_mlt":[{"subitem_text_value":"[出版社版]"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"TAKAHASHI, Kohro"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AN10402595-13-05"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"埼玉大学工学部電気電子工学科"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Department of Electrical Enguneering and Electronics, Faculty of Engineering, Saitama University"}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"1993-12"}]},"item_120_version_type_28":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"高橋, 幸郎"},{"creatorName":"タカハシ, コウロウ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AN10402595-13-05.pdf","filesize":[{"value":"192.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AN10402595-13-05.pdf","url":"https://sucra.repo.nii.ac.jp/record/14785/files/KY-AN10402595-13-05.pdf"},"version_id":"5af07f64-6daf-4a16-8728-ed771c150715"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"CVD法による鉛ガラス薄膜の特性<ミニノート>","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"CVD法による鉛ガラス薄膜の特性<ミニノート>"}]},"item_type_id":"120","owner":"3","path":["486"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-11-12"},"publish_date":"2009-11-12","publish_status":"0","recid":"14785","relation_version_is_last":true,"title":["CVD法による鉛ガラス薄膜の特性<ミニノート>"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T17:52:26.170971+00:00"}