{"created":"2023-05-15T15:26:45.651500+00:00","id":14893,"links":{},"metadata":{"_buckets":{"deposit":"4b1f4f45-8c91-472b-9af6-cfa8e1a6e327"},"_deposit":{"created_by":3,"id":"14893","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"14893"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00014893","sets":["95:240:496:493"]},"author_link":["25178"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Latest Technology of WDX-EPMA"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2000","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"94","bibliographicPageStart":"87","bibliographicVolumeNumber":"20","bibliographic_titles":[{"bibliographic_title":"CACS FORUM"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2010-01-06","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"Several kinds of technologies have been developed for Latest Wavelength Dispersive X-ray spectroscopy EPMA.\nEspecially, new type filament, CeBix is very useful to be used for sub-micron EPMA analysis. This filament is very bright source of electron beam and also is stable for contamination.\nAnother typical technology is Trace Mapping System. This method adopts curved surface simulation technique. With this system, it became possible to mapping analyze almost all kinds of sample, which surface is curved.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00014887","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学分析センター"}]},"item_120_text_27":{"attribute_name":"版","attribute_value_mlt":[{"subitem_text_value":"[出版社版]"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"NIWA, Naoaki"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AN10402595-20-15"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"株式会社島津製作所表面半導体事業部技術部応用技術課"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Research & Development Department, Surface Analysis & Semiconductor Equipment Division SHIMADZU CORPORATION"}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2000-11"}]},"item_120_version_type_28":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"丹羽, 直昌"},{"creatorName":"ニワ, ナオアキ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AN10402595-20-15.pdf","filesize":[{"value":"5.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AN10402595-20-15.pdf","url":"https://sucra.repo.nii.ac.jp/record/14893/files/KY-AN10402595-20-15.pdf"},"version_id":"57b1d95d-fbf4-4d58-9d9f-26560564769e"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"最新の波長分散型EPMAの技術の進展<総説 レビュー>","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"最新の波長分散型EPMAの技術の進展<総説 レビュー>"}]},"item_type_id":"120","owner":"3","path":["493"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-11-12"},"publish_date":"2009-11-12","publish_status":"0","recid":"14893","relation_version_is_last":true,"title":["最新の波長分散型EPMAの技術の進展<総説 レビュー>"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T17:48:39.689917+00:00"}