{"created":"2023-05-15T15:27:21.473901+00:00","id":16122,"links":{},"metadata":{"_buckets":{"deposit":"d65ff630-096c-4424-bb1d-c6fcab4db1e6"},"_deposit":{"created_by":3,"id":"16122","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16122"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016122","sets":["89:355:518"]},"author_link":["18374","26241"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Resistivity and Seebeck coefficient measurements of a bismuth microwire array"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"85","bibliographicPageStart":"81","bibliographicVolumeNumber":"39","bibliographic_titles":[{"bibliographic_title":"埼玉大学紀要. 工学部 第1編 第1部 論文集"},{"bibliographic_title":"The Science and Engineering Reports of Saitama University","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2008-03-19","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"The resistivity and Seebeck coefficient of a bismuth microwire array (wire diameter: 25μm) were successfully measured from 25 to 300 K. To eliminate the influence of the contact resistance between the wire edges of the microwire array and copper electrodes, the titanium (100 nm) /copper (500 nm) film layers were deposited as interlayer on the wire edge by ion plating method. Copper electrodes were glued by using Pb-Sn solder. The resistivity and the Seebeck coefficient at 300K were approximately 1.8μΩm and -54 μV/K, respectively. The value of the resistivity and the Seebeck coefficient were in good agreement with those of bulk polycrystalline bismuth reported previously. Thus, the effects of the contact resistance for the microwire array were almost resolved, and the chemical reaction of the Pb-Sn solder and bismuth was prevented by using the thin film layer. The technique is expected to be applicable to nanowire arrays as well.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016116","subitem_identifier_reg_type":"JaLC"}]},"item_120_other_language_22":{"attribute_name":"その他の言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学工学部"}]},"item_120_publisher_12":{"attribute_name":"出版者名（別言語）","attribute_value_mlt":[{"subitem_publisher":"Faculty of Engineering, Saitama University"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"18804446","subitem_source_identifier_type":"ISSN"}]},"item_120_text_27":{"attribute_name":"版","attribute_value_mlt":[{"subitem_text_value":"[出版社版]"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"ISHIKAWA, Yoshiaki"},{"subitem_text_value":"HASEGAWA, Yasuhiro"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AN00095842-39-13"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"&EMPTY&"},{"subitem_text_value":"埼玉大学大学院理工学研究科環境科学・社会基盤部門"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"&EMPTY&"},{"subitem_text_value":"Graduate School of Science and Engineering, Saitama University"}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2006-7"}]},"item_120_version_type_28":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"石川, 最朗"},{"creatorName":"イシカワ, ヨシアキ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"長谷川, 靖洋"},{"creatorName":"ハセガワ, ヤスヒロ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AN00095842-39-13.pdf","filesize":[{"value":"860.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AN00095842-39-13.pdf","url":"https://sucra.repo.nii.ac.jp/record/16122/files/KY-AN00095842-39-13.pdf"},"version_id":"d9675685-1cf2-4b82-bcd0-39c7ec21c77b"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Microwire array","subitem_subject_scheme":"Other"},{"subitem_subject":"Contact resistance","subitem_subject_scheme":"Other"},{"subitem_subject":"Interlayer","subitem_subject_scheme":"Other"},{"subitem_subject":"Ion plating method","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Biマイクロワイヤーアレイ素子の抵抗率及びゼーベック係数の計測<論文>","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Biマイクロワイヤーアレイ素子の抵抗率及びゼーベック係数の計測<論文>"}]},"item_type_id":"120","owner":"3","path":["518"],"pubdate":{"attribute_name":"公開日","attribute_value":"2008-03-21"},"publish_date":"2008-03-21","publish_status":"0","recid":"16122","relation_version_is_last":true,"title":["Biマイクロワイヤーアレイ素子の抵抗率及びゼーベック係数の計測<論文>"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:51:15.318930+00:00"}