{"created":"2023-05-15T15:27:38.653017+00:00","id":16531,"links":{},"metadata":{"_buckets":{"deposit":"3d24a3a4-ca67-45cb-9d08-0af98c3c2a2d"},"_deposit":{"created_by":3,"id":"16531","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16531"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016531","sets":["95:238:631"]},"author_link":["26855","26857","26856"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Evaluation of High-resolution Proximity Exposure System"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"63","bibliographicPageStart":"61","bibliographicVolumeNumber":"2","bibliographic_titles":[{"bibliographic_title":"埼玉大学地域オープンイノベーションセンター紀要"},{"bibliographic_title":"Report of Comprehensive Open Innovation Center, Saitama University","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2010-07-31","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"High-resolution proximity exposure (mask alignment) system for semiconductor micro fabrication has been developed and evaluated. A novel exposure system has laser displacement meter for high-precision measurement of the gap between the mask and the wafer. The repeatability error of the displacement meter was 0.025μm. The exposure system also contains highly collimated UV source. The illumination intensity uniformity was within 5% and the main wavelength was 365nm. The resolution of the system was 3 μm in proximity exposure (gap: 10 μm) and 1.5 μm in contact exposure.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016525","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学総合研究機構地域オープンイノベーションセンター"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"18838278","subitem_source_identifier_type":"ISSN"}]},"item_120_text_27":{"attribute_name":"版","attribute_value_mlt":[{"subitem_text_value":"[出版社版]"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"MORI, Ryotaro"},{"subitem_text_value":"TAKAHASHI, Kohro"},{"subitem_text_value":"OHSAWA, Mitsuaki"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-18838278-2-22"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"埼玉大学工学部電気電子システム工学科"},{"subitem_text_value":"埼玉大学工学部電気電子システム工学科"},{"subitem_text_value":"株式会社エイ・エス・エイ・ピイ"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Department of Electrical and Electronic Systems, School of Engineering, Saitama University"},{"subitem_text_value":"Department of Electrical and Electronic Systems, School of Engineering, Saitama University"},{"subitem_text_value":"ASAP Co., Ltd."}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2010-7"}]},"item_120_version_type_28":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"森, 涼太郎"},{"creatorName":"モリ, リョウタロウ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"高橋, 幸郎"},{"creatorName":"タカハシ, コウロウ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"大澤, 光明"},{"creatorName":"オオサワ, ミツアキ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-18838278-2-22.pdf","filesize":[{"value":"1.6 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-18838278-2-22.pdf","url":"https://sucra.repo.nii.ac.jp/record/16531/files/KY-18838278-2-22.pdf"},"version_id":"299e92cf-f814-4e71-8ecf-1609c51a7b63"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Mask aligner","subitem_subject_scheme":"Other"},{"subitem_subject":"Proximity exposure","subitem_subject_scheme":"Other"},{"subitem_subject":"Micro fabrication","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"高精度非接触式等倍露光(マスクアライメント)装置の性能評価","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"高精度非接触式等倍露光(マスクアライメント)装置の性能評価"}]},"item_type_id":"120","owner":"3","path":["631"],"pubdate":{"attribute_name":"公開日","attribute_value":"2010-07-30"},"publish_date":"2010-07-30","publish_status":"0","recid":"16531","relation_version_is_last":true,"title":["高精度非接触式等倍露光(マスクアライメント)装置の性能評価"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:04:19.568183+00:00"}