{"created":"2023-05-15T15:27:42.204764+00:00","id":16613,"links":{},"metadata":{"_buckets":{"deposit":"896652da-e0d5-4b59-b582-11e7c98a0e80"},"_deposit":{"created_by":3,"id":"16613","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16613"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016613","sets":["95:239:634"]},"author_link":["27044","27046","27043","27045"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"BASIC STUDYOF OXIDE FILM PLANARIZATION-CMP WITH CERIA SLURRY"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"22","bibliographicPageStart":"18","bibliographicVolumeNumber":"2","bibliographic_titles":[{"bibliographic_title":"埼玉大学地域共同研究センター紀要"},{"bibliographic_title":"Report of Cooperative Research Center, Saitama University","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2009-06-18","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"Ceria(CeO2) slurry has a strong merit in CMF polishing to give a high removal rate. However, it has an unfavorable reputation of problems linked to its quick sedimentation, agglomeration of particles, purity, difficult cleaning, and high cost. In the present study, focusing on the particular issue of the slurry dispersibility, we examined the effect ofultra-sonic (US) treatment ofslurry on its stability and its CMF polishing characteristics in order to make ceria slurry stably applicable to the planarizationCMF. As a result, the US treatment has proved remarkably effective in the elimination of agglomerates, improvement of slurry stability, increase of removal rate and better roughness, offering a breakthrough for the realization ofhigh performance ceria slurry for CMP planarization Comparing to silica slurry, we thus obtained ceria slurry that produces same polished roughness but six times higher removal rate when polished at the pressure of 500g/cm^2.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016607","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学地域共同研究センター"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13474758","subitem_source_identifier_type":"ISSN"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"B. PACAUD"},{"subitem_text_value":"T. K. DOY"},{"subitem_text_value":"Y.SASAKAWA"},{"subitem_text_value":"E.. ROHART"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AA11808968-02-06"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"ローディア エレクトロニクス カタリシス"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"ローディア エレクトロニクス カタリシス"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Rhodia Electronics & Catalysis"},{"subitem_text_value":"Faculty of Education, Saitama University"},{"subitem_text_value":"Faculty of Education , Saitama University"},{"subitem_text_value":"Rhodia Electronics & Catalysis"}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2001"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"ベルナール, ・パコ"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"土肥, 俊郎"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"笹川, 有紀"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"ロアート・, エマニエル"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AA11808968-02-06.pdf","filesize":[{"value":"331.2 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AA11808968-02-06.pdf","url":"https://sucra.repo.nii.ac.jp/record/16613/files/KY-AA11808968-02-06.pdf"},"version_id":"a7ceea3a-772a-461a-a85e-32d62db04558"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"CMP","subitem_subject_scheme":"Other"},{"subitem_subject":"Ceria slurry","subitem_subject_scheme":"Other"},{"subitem_subject":"Ultra sonic treatment","subitem_subject_scheme":"Other"},{"subitem_subject":"Removal rate","subitem_subject_scheme":"Other"},{"subitem_subject":"Surface roughness","subitem_subject_scheme":"Other"},{"subitem_subject":"Zeta potential","subitem_subject_scheme":"Other"},{"subitem_subject":"Stability","subitem_subject_scheme":"Other"},{"subitem_subject":"Concentration","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討"}]},"item_type_id":"120","owner":"3","path":["634"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-06-02"},"publish_date":"2009-06-02","publish_status":"0","recid":"16613","relation_version_is_last":true,"title":["セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:15:20.301063+00:00"}