{"created":"2023-05-15T15:27:42.246286+00:00","id":16614,"links":{},"metadata":{"_buckets":{"deposit":"d5804e84-0709-40e3-beeb-0d7be9d55835"},"_deposit":{"created_by":3,"id":"16614","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16614"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016614","sets":["95:239:634"]},"author_link":["27049","27048","27047"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Influence of Surfactants on Polishing Performances of CMP Slurry"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"26","bibliographicPageStart":"23","bibliographicVolumeNumber":"2","bibliographic_titles":[{"bibliographic_title":"埼玉大学地域共同研究センター紀要"},{"bibliographic_title":"Report of Cooperative Research Center, Saitama University","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2009-06-18","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"The influence of three different ion type surfactants on fumed silica slurry was studied. The increase of removal rate was observed when the small amount of longer alkyl chain anionic surfactant was added to the slurry. The addition of cationic surfactant caused the significant decrease of removal rate. The addition of nonionic surfactant showed the moderate decrease of removal rate. These differences of polishing performances are considered to be caused by the interaction between surfactants and abrasives/SiO2 film formed over silicon wafer.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016608","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学地域共同研究センター"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13474758","subitem_source_identifier_type":"ISSN"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"Shinji Hamamoto"},{"subitem_text_value":"Toshiroh Doy"},{"subitem_text_value":"Kenzo Yokoyama"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AA11808968-02-07"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"ユシロ化学工業株式会社"},{"subitem_text_value":"埼玉大学教育学部機械技術研究室"},{"subitem_text_value":"ユシロ化学工業株式会社"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Yushiro Chemical Industry Co., Ltd."},{"subitem_text_value":"Mechanical Engineering Lab., Faculty of Education, Saitama University"},{"subitem_text_value":"Yushiro Chemical Industry Co., Ltd."}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2001"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"浜元, 伸二"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"土肥, 俊郎"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"横山, 健三"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AA11808968-02-07.pdf","filesize":[{"value":"223.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AA11808968-02-07.pdf","url":"https://sucra.repo.nii.ac.jp/record/16614/files/KY-AA11808968-02-07.pdf"},"version_id":"dcd4f6ca-9080-450a-94ca-faafb6d18d04"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"CMP","subitem_subject_scheme":"Other"},{"subitem_subject":"Slurry","subitem_subject_scheme":"Other"},{"subitem_subject":"Surfactant","subitem_subject_scheme":"Other"},{"subitem_subject":"Anion","subitem_subject_scheme":"Other"},{"subitem_subject":"Cation","subitem_subject_scheme":"Other"},{"subitem_subject":"Nonion","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"CMP用スラリーにおける界面活性剤の加工特性に及ぼす挙動","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"CMP用スラリーにおける界面活性剤の加工特性に及ぼす挙動"}]},"item_type_id":"120","owner":"3","path":["634"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-06-02"},"publish_date":"2009-06-02","publish_status":"0","recid":"16614","relation_version_is_last":true,"title":["CMP用スラリーにおける界面活性剤の加工特性に及ぼす挙動"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:15:22.378949+00:00"}