{"created":"2023-05-15T15:27:42.661237+00:00","id":16624,"links":{},"metadata":{"_buckets":{"deposit":"13d90f55-486f-4e8f-b054-e2d196edbbf6"},"_deposit":{"created_by":3,"id":"16624","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16624"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016624","sets":["95:239:634"]},"author_link":["27081","27084","27080","27082","27083"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Highly accurate processing and its basic characteristic of ceramic electro-static chuck"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"72","bibliographicPageStart":"69","bibliographicVolumeNumber":"2","bibliographic_titles":[{"bibliographic_title":"埼玉大学地域共同研究センター紀要"},{"bibliographic_title":"Report of Cooperative Research Center, Saitama University","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2006-07-18","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"This paper proposes the method of processing the surface of the electro-static chuck in a high accuracy. The electro-static chuck is applied as a device for the adsorption of wafers. To keep the homogeneity of temperature distribution, the surface should have a stable flatness. The uniform spreading of an adhesive was examined by using a spin-coater. As the results, the spin-coater uniformly spreads the adhesive, and the flatness on the surface\nof the electro-static chuck has improved from 8i m to 44i m. Additionally, an inert gas should uniformly flow to all aspects of the wafer to optimize the temperature of the wafer. Authors proposed to install a minute ruggedness on the surface of electro-static chuck to form the stable gas route by lapping.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016618","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学地域共同研究センター"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13474758","subitem_source_identifier_type":"ISSN"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"Hiroshi Hattori"},{"subitem_text_value":"Toshiroh Doy"},{"subitem_text_value":"Masaki Kinoshita"},{"subitem_text_value":"Koki Tamagawal"},{"subitem_text_value":"Kunihiko Katohl"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AA11808968-02-18"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"株式会社富士通東北エレクトロニクス"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"株式会社富士通東北エレクトロニクス"},{"subitem_text_value":"株式会社富士通東北エレクトロニクス"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Fujitsu Tohoku Electronics Ltd."},{"subitem_text_value":"Faculty of Education, Saitama University"},{"subitem_text_value":"Faculty of Education, Saitama University"},{"subitem_text_value":"Fujitsu Tohoku Electronics Ltd."},{"subitem_text_value":"Fujitsu Tohoku Electronics Ltd."}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2001"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"服部, 博"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"土肥, 俊郎"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"木下, 将毅"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"玉川, 晃樹"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"加藤, 邦彦"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AA11808968-02-18.pdf","filesize":[{"value":"251.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AA11808968-02-18.pdf","url":"https://sucra.repo.nii.ac.jp/record/16624/files/KY-AA11808968-02-18.pdf"},"version_id":"af3d776e-c751-4a36-9613-13874194c9d5"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Electro-static chuck","subitem_subject_scheme":"Other"},{"subitem_subject":"Spin-coater","subitem_subject_scheme":"Other"},{"subitem_subject":"Lapping","subitem_subject_scheme":"Other"},{"subitem_subject":"Surface roughness","subitem_subject_scheme":"Other"},{"subitem_subject":"Alumina ceramics","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"セラミック静電チャックに関する高精度加工プロセスとその基本特性","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"セラミック静電チャックに関する高精度加工プロセスとその基本特性"}]},"item_type_id":"120","owner":"3","path":["634"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-06-02"},"publish_date":"2009-06-02","publish_status":"0","recid":"16624","relation_version_is_last":true,"title":["セラミック静電チャックに関する高精度加工プロセスとその基本特性"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:15:54.106634+00:00"}