{"created":"2023-05-15T15:27:45.473663+00:00","id":16691,"links":{},"metadata":{"_buckets":{"deposit":"a4e275e0-66e6-4392-9d2b-edb47408b343"},"_deposit":{"created_by":3,"id":"16691","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"16691"},"status":"published"},"_oai":{"id":"oai:sucra.repo.nii.ac.jp:00016691","sets":["95:239:636"]},"author_link":["27257","27256","27258","27259"],"item_120_alternative_title_1":{"attribute_name":"タイトル（別言語）","attribute_value_mlt":[{"subitem_alternative_title":"Basic Study Of Oxide Film Planarization -CMP With Ceria Slurry"}]},"item_120_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2004","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"17","bibliographicPageStart":"14","bibliographicVolumeNumber":"4","bibliographic_titles":[{"bibliographic_title":"埼玉大学地域共同研究センター紀要"},{"bibliographic_title":"Report of Cooperative Research Center, Saitama Univerity","bibliographic_titleLang":"en"}]}]},"item_120_date_31":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2009-06-18","subitem_date_issued_type":"Created"}]},"item_120_description_19":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"In this study, ceria slurries (CeOz) for oxide fIlms are applied for planarization CMP for high performance and high-grade polishing. The investigation on ceria slurry focused on calcination temperature was carried out. Polishing characteristics of oxide mms to disperse ceria particles, which is necessary to make ceria slurry work efficiently, were found. The results indicate that the dispersibility and the removal rate of ceria slurry are affected by pH and the additive rate, and in particular, the removal rate is on the decrease especially by adding the additives.","subitem_description_type":"Other"}]},"item_120_description_29":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"text","subitem_description_type":"Other"}]},"item_120_description_30":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_120_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.24561/00016685","subitem_identifier_reg_type":"JaLC"}]},"item_120_publisher_11":{"attribute_name":"出版者名","attribute_value_mlt":[{"subitem_publisher":"埼玉大学地域共同研究センター"}]},"item_120_source_id_14":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13474758","subitem_source_identifier_type":"ISSN"}]},"item_120_text_3":{"attribute_name":"著者 ローマ字","attribute_value_mlt":[{"subitem_text_value":"Bernard Pacaud"},{"subitem_text_value":"Toshiro. K. Doi"},{"subitem_text_value":"Yukako Ueki"},{"subitem_text_value":"Emmanuelle.Rohart"}]},"item_120_text_32":{"attribute_name":"アイテムID","attribute_value_mlt":[{"subitem_text_value":"KY-AA11808968-04-04"}]},"item_120_text_4":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"ローディア エレクトロニクス カタリシス"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"埼玉大学教育学部"},{"subitem_text_value":"ローディア エレクトロニクス カタリシス"}]},"item_120_text_5":{"attribute_name":"著者 所属(別言語)","attribute_value_mlt":[{"subitem_text_value":"Rhodia Electronics & Catalysis in France in France"},{"subitem_text_value":"Faculty of Education, Saitama University"},{"subitem_text_value":"Faculty of Education, Saitama University"},{"subitem_text_value":"Rhodia Electronics & Catalysis in France in France"}]},"item_120_text_9":{"attribute_name":"年月次","attribute_value_mlt":[{"subitem_text_value":"2003"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"ベルナール, ・パコ"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"土肥, 俊郎"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"植木, 由佳子"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"エマニエル, ・ロアート"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-01-24"}],"displaytype":"detail","filename":"KY-AA11808968-04-04.pdf","filesize":[{"value":"221.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KY-AA11808968-04-04.pdf","url":"https://sucra.repo.nii.ac.jp/record/16691/files/KY-AA11808968-04-04.pdf"},"version_id":"01856fc1-455a-4b30-95c1-558f82b94022"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"CMP","subitem_subject_scheme":"Other"},{"subitem_subject":"ceria slurry","subitem_subject_scheme":"Other"},{"subitem_subject":"removal rate","subitem_subject_scheme":"Other"},{"subitem_subject":"isoelectric point","subitem_subject_scheme":"Other"},{"subitem_subject":"zeta potential","subitem_subject_scheme":"Other"},{"subitem_subject":"particle size","subitem_subject_scheme":"Other"},{"subitem_subject":"anion surfactant","subitem_subject_scheme":"Other"},{"subitem_subject":"stability","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討"}]},"item_type_id":"120","owner":"3","path":["636"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-05-14"},"publish_date":"2009-05-14","publish_status":"0","recid":"16691","relation_version_is_last":true,"title":["セリアスラリーによる酸化膜の平坦化CMPに関する基礎的検討"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-15T18:11:56.612263+00:00"}