@article{oai:sucra.repo.nii.ac.jp:00016790,
 author = {門村, 和徳 and 福西, 利夫 and 土肥, 俊郎 and 内田, 亮太},
 journal = {埼玉大学地域共同研究センター紀要, Report of Cooperative Research Center, Saitama University},
 month = {},
 note = {As the basic research for the Pad conditioning by the Diamond Conditioner, relationship between the surface condition of pad, which is ground by the diamond pad conditioner, and the Polishing Rate is investigated. Clogging of the pad surface, the surface conditions achieved by specification of the various pad conditioners and various parameters of the conditioning on the Oxide-CMP Process are correlated., text, application/pdf},
 pages = {24--26},
 title = {CMP用パッドのコンディショニングに関する基礎研究（第二報）},
 volume = {7},
 year = {2007},
 yomi = {カドムラ, カズノリ and フクニシ, トシオ and ドイ, トシロウ and ウチダ, リョウタ}
}