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  1. 理工学研究科
  2. 01 学術雑誌論文

Characterization of oxide films on 4H-SiC epitaxial (000(1)over-bar) faces by high-energy-resolution photoemission spectroscopy: Comparison between wet and dry oxidation

https://sucra.repo.nii.ac.jp/records/12941
https://sucra.repo.nii.ac.jp/records/12941
cb613bc4-15c2-46e3-8102-19ed3bd8af37
名前 / ファイル ライセンス アクション
A1002272.pdf A1002272.pdf (121.5 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2007-10-17
タイトル
タイトル Characterization of oxide films on 4H-SiC epitaxial (000(1)over-bar) faces by high-energy-resolution photoemission spectroscopy: Comparison between wet and dry oxidation
言語
言語 eng
キーワード
主題Scheme Other
主題 RAY PHOTOELECTRON-SPECTROSCOPY
キーワード
主題Scheme Other
主題 C(000(1)OVER-BAR) FACE
キーワード
主題Scheme Other
主題 SYNCHROTRON-RADIATION
キーワード
主題Scheme Other
主題 INTERFACE STRUCTURES
キーワード
主題Scheme Other
主題 SILICON-CARBIDE
キーワード
主題Scheme Other
主題 ELLIPSOMETRY
キーワード
主題Scheme Other
主題 STATES
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 土方, 泰斗

× 土方, 泰斗

WEKO 18434
研究者総覧 BVgusmBx

土方, 泰斗

ja-Kana ヒジカタ, ヤスト

Search repository
矢口, 裕之

× 矢口, 裕之

WEKO 16578
研究者総覧 sZUxYNBe

矢口, 裕之

ja-Kana ヤグチ, ヒロユキ

Search repository
吉田, 貞史

× 吉田, 貞史

WEKO 20430

吉田, 貞史

ja-Kana ヨシダ, サダフミ

Search repository
著者 ローマ字
Hijikata, Yasuto
著者 ローマ字
Yaguchi, Hiroyuki
著者 ローマ字
Yoshida, Sadafumi
著者 ローマ字
Takata, Yasutaka
著者 ローマ字
Kobayashi, Keisuke
著者 ローマ字
Nohira, Hiroshi
著者 ローマ字
Hattori, Takeo
著者 所属
埼玉大学大学院理工学研究科数理電子情報部門電気電子システム領域
著者 所属
埼玉大学工学部電気電子工学科
著者 所属
埼玉大学工学部電気電子工学科
著者 所属
独立行政法人理化学研究所
著者 所属
財団法人高輝度光科学研究センター
著者 所属(別言語)
Graduate School of Science and Engineering, Saitama University
著者 所属(別言語)
Department of Electrical and Electronic Systems Engineering, Saitama University
著者 所属(別言語)
Department of Electrical and Electronic Systems Engineering, Saitama University
著者 所属(別言語)
RIKEN (The Institute of Physical and Chemical Research)
著者 所属(別言語)
Japan Synchrotron Radiation Research Institute(JASRI)
著者 所属(別言語)
Musashi Institute of Technology
著者 所属(別言語)
Research Center for Silicon Nano-Science, Advanced Research Laboratories, Musashi Institute of Technology
書誌情報 JOURNAL OF APPLIED PHYSICS

巻 100, 号 5, p. 053710-1-053710-7, 発行日 2006
年月次
2006-9
出版者名
出版者 American Institute of Physics
ISSN
収録物識別子タイプ ISSN
収録物識別子 00218979
DOI
識別子タイプ DOI
関連識別子 info:doi/10.1063/1.2345471
抄録
内容記述タイプ Abstract
内容記述 Wet and dry oxide films-4H-SiC epitaxial (000 (1) over bar) C-face interfaces have been characterized by capacitance-voltage (C-V) measurements and soft x-ray excited photoemission spectroscopy (SX-PES) and hard x-ray excited photoemission spectroscopy (HX-PES) using synchrotron radiation. The interface state density for wet oxidation is much smaller than that for dry oxidation at any energy level. In the PES measurements, intermediate oxidation states such as Si1+ and Si3+ were observed. In addition, the areal densities of these states were found to be in a good correspondence with those of the interface states. The reasons for the good electrical characteristics of metal-oxide-semiconductor devices fabricated by wet oxidation are discussed in terms of the depth profiles of oxide films derived from the SX-PES and HX-PES results. (c) 2006 American Institute of Physics.
注記
内容記述タイプ Other
内容記述 copyright(c)2006 American Institute of Physics.
資源タイプ
内容記述タイプ Other
内容記述 text
フォーマット
内容記述タイプ Other
内容記述 application/pdf
作成日
日付 2007-10-16
日付タイプ Created
アイテムID
A1002272
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