WEKO3
アイテム
{"_buckets": {"deposit": "13d90f55-486f-4e8f-b054-e2d196edbbf6"}, "_deposit": {"created_by": 3, "id": "16624", "owners": [3], "pid": {"revision_id": 0, "type": "depid", "value": "16624"}, "status": "published"}, "_oai": {"id": "oai:sucra.repo.nii.ac.jp:00016624", "sets": ["634"]}, "author_link": ["27081", "27084", "27080", "27082", "27083"], "item_120_alternative_title_1": {"attribute_name": "タイトル(別言語)", "attribute_value_mlt": [{"subitem_alternative_title": "Highly accurate processing and its basic characteristic of ceramic electro-static chuck"}]}, "item_120_biblio_info_8": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2002", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "72", "bibliographicPageStart": "69", "bibliographicVolumeNumber": "2", "bibliographic_titles": [{"bibliographic_title": "埼玉大学地域共同研究センター紀要"}, {"bibliographic_title": "Report of Cooperative Research Center, Saitama University", "bibliographic_titleLang": "en"}]}]}, "item_120_date_31": {"attribute_name": "作成日", "attribute_value_mlt": [{"subitem_date_issued_datetime": "2006-07-18", "subitem_date_issued_type": "Created"}]}, "item_120_description_19": {"attribute_name": "概要", "attribute_value_mlt": [{"subitem_description": "This paper proposes the method of processing the surface of the electro-static chuck in a high accuracy. The electro-static chuck is applied as a device for the adsorption of wafers. To keep the homogeneity of temperature distribution, the surface should have a stable flatness. The uniform spreading of an adhesive was examined by using a spin-coater. As the results, the spin-coater uniformly spreads the adhesive, and the flatness on the surface\nof the electro-static chuck has improved from 8i m to 44i m. Additionally, an inert gas should uniformly flow to all aspects of the wafer to optimize the temperature of the wafer. Authors proposed to install a minute ruggedness on the surface of electro-static chuck to form the stable gas route by lapping.", "subitem_description_type": "Other"}]}, "item_120_description_29": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"subitem_description": "text", "subitem_description_type": "Other"}]}, "item_120_description_30": {"attribute_name": "フォーマット", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_120_identifier_registration": {"attribute_name": "ID登録", "attribute_value_mlt": [{"subitem_identifier_reg_text": "10.24561/00016618", "subitem_identifier_reg_type": "JaLC"}]}, "item_120_publisher_11": {"attribute_name": "出版者名", "attribute_value_mlt": [{"subitem_publisher": "埼玉大学地域共同研究センター"}]}, "item_120_source_id_14": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "13474758", "subitem_source_identifier_type": "ISSN"}]}, "item_120_text_3": {"attribute_name": "著者 ローマ字", "attribute_value_mlt": [{"subitem_text_value": "Hiroshi Hattori"}, {"subitem_text_value": "Toshiroh Doy"}, {"subitem_text_value": "Masaki Kinoshita"}, {"subitem_text_value": "Koki Tamagawal"}, {"subitem_text_value": "Kunihiko Katohl"}]}, "item_120_text_32": {"attribute_name": "アイテムID", "attribute_value_mlt": [{"subitem_text_value": "KY-AA11808968-02-18"}]}, "item_120_text_35": {"attribute_name": "公開日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 2, 2009 09:00:00"}]}, "item_120_text_36": {"attribute_name": "記録日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "2006-07-18"}]}, "item_120_text_37": {"attribute_name": "最終更新日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 18, 2009 13:03:50"}]}, "item_120_text_38": {"attribute_name": "公開日(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 2, 2009 09:00:00"}]}, "item_120_text_39": {"attribute_name": "更新履歴(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "Jun 18, 2009 所有者を murata から sucra_jim4 に変更"}, {"subitem_text_value": "Jun 18, 2009 フリーキーワード, 作成日, 記録日 を変更"}, {"subitem_text_value": "Jun 4, 2009 所有者を sucra_jim4 から murata に変更"}, {"subitem_text_value": "Jun 3, 2009 フリーキーワード, インデックス, 抄録, キーワード を変更"}]}, "item_120_text_4": {"attribute_name": "著者 所属", "attribute_value_mlt": [{"subitem_text_value": "株式会社富士通東北エレクトロニクス"}, {"subitem_text_value": "埼玉大学教育学部"}, {"subitem_text_value": "埼玉大学教育学部"}, {"subitem_text_value": "株式会社富士通東北エレクトロニクス"}, {"subitem_text_value": "株式会社富士通東北エレクトロニクス"}]}, "item_120_text_40": {"attribute_name": "登録者(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "sucra_jim4"}]}, "item_120_text_41": {"attribute_name": "閲覧数(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "1415"}]}, "item_120_text_42": {"attribute_name": "ダウンロード数(XooNIps)", "attribute_value_mlt": [{"subitem_text_value": "1943"}]}, "item_120_text_43": {"attribute_name": "XooNIps_インデックス", "attribute_value_mlt": [{"subitem_text_value": "Public/ジャンル別/研究紀要/埼玉大学/地域共同研究センター紀要|Public/埼玉大学/教育学部|Public/主題別/工学/機械工学/生産工学・加工学|sucra_jim4/埼玉大学/murata"}]}, "item_120_text_44": {"attribute_name": "XooNIps_ITEM_KEY", "attribute_value_mlt": [{"subitem_text_value": "4147"}]}, "item_120_text_5": {"attribute_name": "著者 所属(別言語)", "attribute_value_mlt": [{"subitem_text_value": "Fujitsu Tohoku Electronics Ltd."}, {"subitem_text_value": "Faculty of Education, Saitama University"}, {"subitem_text_value": "Faculty of Education, Saitama University"}, {"subitem_text_value": "Fujitsu Tohoku Electronics Ltd."}, {"subitem_text_value": "Fujitsu Tohoku Electronics Ltd."}]}, "item_120_text_9": {"attribute_name": "年月次", "attribute_value_mlt": [{"subitem_text_value": "2001"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "服部, 博"}], "nameIdentifiers": [{"nameIdentifier": "27080", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "土肥, 俊郎"}], "nameIdentifiers": [{"nameIdentifier": "27081", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "木下, 将毅"}], "nameIdentifiers": [{"nameIdentifier": "27082", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "玉川, 晃樹"}], "nameIdentifiers": [{"nameIdentifier": "27083", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "加藤, 邦彦"}], "nameIdentifiers": [{"nameIdentifier": "27084", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2018-01-24"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "KY-AA11808968-02-18.pdf", "filesize": [{"value": "251.4 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 251400.0, "url": {"label": "KY-AA11808968-02-18.pdf", "url": "https://sucra.repo.nii.ac.jp/record/16624/files/KY-AA11808968-02-18.pdf"}, "version_id": "af3d776e-c751-4a36-9613-13874194c9d5"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "Electro-static chuck", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Spin-coater", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Lapping", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Surface roughness", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Alumina ceramics", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "departmental bulletin paper", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "セラミック静電チャックに関する高精度加工プロセスとその基本特性", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "セラミック静電チャックに関する高精度加工プロセスとその基本特性"}]}, "item_type_id": "120", "owner": "3", "path": ["634"], "permalink_uri": "https://doi.org/10.24561/00016618", "pubdate": {"attribute_name": "公開日", "attribute_value": "2009-06-02"}, "publish_date": "2009-06-02", "publish_status": "0", "recid": "16624", "relation": {}, "relation_version_is_last": true, "title": ["セラミック静電チャックに関する高精度加工プロセスとその基本特性"], "weko_shared_id": -1}
セラミック静電チャックに関する高精度加工プロセスとその基本特性
https://doi.org/10.24561/00016618
https://doi.org/10.24561/0001661856383d48-2892-4495-aea0-69661438367d
名前 / ファイル | ライセンス | アクション |
---|---|---|
KY-AA11808968-02-18.pdf (251.4 kB)
|
|
Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2009-06-02 | |||||
タイトル | ||||||
タイトル | セラミック静電チャックに関する高精度加工プロセスとその基本特性 | |||||
言語 | ||||||
言語 | jpn | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Electro-static chuck | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Spin-coater | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Lapping | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Surface roughness | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Alumina ceramics | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
ID登録 | ||||||
ID登録 | 10.24561/00016618 | |||||
ID登録タイプ | JaLC | |||||
タイトル(別言語) | ||||||
その他のタイトル | Highly accurate processing and its basic characteristic of ceramic electro-static chuck | |||||
著者 |
服部, 博
× 服部, 博× 土肥, 俊郎× 木下, 将毅× 玉川, 晃樹× 加藤, 邦彦 |
|||||
著者 ローマ字 | ||||||
Hiroshi Hattori | ||||||
著者 ローマ字 | ||||||
Toshiroh Doy | ||||||
著者 ローマ字 | ||||||
Masaki Kinoshita | ||||||
著者 ローマ字 | ||||||
Koki Tamagawal | ||||||
著者 ローマ字 | ||||||
Kunihiko Katohl | ||||||
著者 所属 | ||||||
株式会社富士通東北エレクトロニクス | ||||||
著者 所属 | ||||||
埼玉大学教育学部 | ||||||
著者 所属 | ||||||
埼玉大学教育学部 | ||||||
著者 所属 | ||||||
株式会社富士通東北エレクトロニクス | ||||||
著者 所属 | ||||||
株式会社富士通東北エレクトロニクス | ||||||
著者 所属(別言語) | ||||||
Fujitsu Tohoku Electronics Ltd. | ||||||
著者 所属(別言語) | ||||||
Faculty of Education, Saitama University | ||||||
著者 所属(別言語) | ||||||
Faculty of Education, Saitama University | ||||||
著者 所属(別言語) | ||||||
Fujitsu Tohoku Electronics Ltd. | ||||||
著者 所属(別言語) | ||||||
Fujitsu Tohoku Electronics Ltd. | ||||||
書誌情報 |
埼玉大学地域共同研究センター紀要 en : Report of Cooperative Research Center, Saitama University 巻 2, p. 69-72, 発行日 2002 |
|||||
年月次 | ||||||
2001 | ||||||
出版者名 | ||||||
出版者 | 埼玉大学地域共同研究センター | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13474758 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | This paper proposes the method of processing the surface of the electro-static chuck in a high accuracy. The electro-static chuck is applied as a device for the adsorption of wafers. To keep the homogeneity of temperature distribution, the surface should have a stable flatness. The uniform spreading of an adhesive was examined by using a spin-coater. As the results, the spin-coater uniformly spreads the adhesive, and the flatness on the surface of the electro-static chuck has improved from 8i m to 44i m. Additionally, an inert gas should uniformly flow to all aspects of the wafer to optimize the temperature of the wafer. Authors proposed to install a minute ruggedness on the surface of electro-static chuck to form the stable gas route by lapping. |
|||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | text | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
作成日 | ||||||
日付 | 2006-07-18 | |||||
日付タイプ | Created | |||||
アイテムID | ||||||
KY-AA11808968-02-18 |